| Material / forming | Fusion-drawn borosilicate glass |
|---|---|
| Wafer thickness | 0.2–1.4 mm; standard 0.5, 0.7, 0.85, 1.1 and 1.4 mm |
| Wafer TTV | ≤10 µm standard; ≤1 µm available |
| Wafer warp | ≤100 µm |
| Panel capability | 0.4–1.4 mm; up to 600 × 600 mm; TTV ≤10 µm; warp ≤500 µm |
| Density | 2.234 g/cm³ |
| Young’s modulus / Poisson’s ratio | 61.5 GPa / 0.19 |
| Shear modulus / Vickers hardness | 25.8 GPa / 520 kgf/mm² |
| CTE | 3.43 × 10⁻⁶/°C, 0–300°C |
| Refractive index | 1.472 at 589.3 nm |
For a China-made alternative, we match the borosilicate composition class, CTE near silicon, anodic-bonding behavior, TTV/warp, surface finish and optical transmission before recommending a wafer or panel.
Recommended matching criteria:
Manufacturer and product names are used only to identify reference materials and technical targets. Semicon Global Tech is an independent supplier and does not claim manufacturer authorization unless explicitly stated. Original-grade data and China-made alternative specifications are presented separately; supply specifications are confirmed by quotation, COA and approved samples.